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The Analysis and Research of SubstrateMaterial for MOS.CCD.VLSl

Liu Yuling Liu Zhifu  
In this paper, the advantages of silicon epitaxial material for MOS, CCD. and VLSI are given in details from the theory. Through experiment, the New problems in manufacture are analysed, and the methods of solution are indicated.
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【Co-citations】
Chinese Journal Full-text Database 10 Hits
1 HE Yu-liang (The Physics Department of Nanjing University,Nanjing210093,China);Strange features of nano crystalline silicon diode[J];Semiconductor Information;2002-01
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Chinese Journal Full-text Database 10 Hits
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