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《The Chinese Journal of Process Engineering》 2001-02
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Preparation of Monodisperse Silica Ultramicrons

WANG Ling-lingl,FANG Xiao-longl,TANG Fang-qiong2,YANG Chuan-fangl, LIU Hui-Zhoul (1. Youth Lab. Sep.Sci.and Eng ., Inst. Chem. Metall., Chinese Academy of Sciences, Beijing 100080, China; 2. Inst. Photographic Chem., Chinese Academy of Sciences, Be  
Preparation of silica ultramicrons was reported by using three different surfactants in reverse micellar systems and by using the conventional Stober method. It was found that in the anionic surfactant-based system (AOT/cyclohexane/NH3(H2O reverse micelles) the particle size increases as the water to surfactant molar ratio(wo) is increased. While in the non-ionic surfactant-based system (TritonX(100/hexano1/cyclohexane/NH3(H2O reverse micelles) the particle size decreases as wo is increased. It seems impossible to prepare SiO2 in cationic surfactant- based reverse micelles, such as CTAB and TOMAC systems. Effects of different system conditions on particle size and shape were studied. The particle size distribution and standard deviation were also compared among different methods. It indicates that the reverse micellar method is more suitable for synthesis of silica particles of diameter below 100 nm with lower standard deviation than the Stober method. But the latter is still a good method for preparing larger silica particles((100nm).
【Fund】: 国家自然科学基金资助项目!(编号:29776046)
【CateGory Index】: TQl27.2
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