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《中国科学:技术科学(英文版)》 2010-01
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Large area mold fabrication for the nanoimprint lithography using electron beam lithography

CHU JinKui1,2,MENG FanTao1,2,HAN ZhiTao1,2 & GUO Qing1,2 1 Key Laboratory for Micro/Nano Technology and System of Liaoning Province,Dalian University of Technology,Dalian 116024,China;2 Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education,Dalian University of Technology,Dalian 116024,China  
The mold fabrication is a critical issue for the development of nanoimprint lithography as an effective low-cost and mass production process.This paper describes the fabrication process developed to fabricate the large area nanoimprint molds on the silicon wafers.The optimization of e-beam exposure dose and pattern design is presented.The overlayer process is developed to improve the field stitching accuracy of e-beam exposure,and around 10 nm field stitching accuracy is obtained.By means of the optimization of the e-beam exposure dose,pattern design and overlayer process,large area nanoimprint molds having dense line structures with around 10 nm field stitching accuracy have been fabricated.The fabricated mold was used to imprint commercial imprinting resist.
【Fund】: supported by the National Basic Research Program of China (Grant No.2006CB00407);; the National Natural Science Foundation of China (Grant No.50775017);; the Program for New Century Excellent Talents in University (Grant No.NCET-04-0266)
【CateGory Index】: TG665
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