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《Laser & Optoelectronics Progress》 2007-01
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Recent Development of International Mainstream Lithographic Tools

YUAN Qiongyan1,2 WANG Xiangzhao1,21 Information Optics Laboratory,Shanghai Institute of Optics and Fine Mechanics,The Chinese Academy of Sciences,Shanghai 201800 2 Graduate University of Chinese Academy of Science,Beijing 100039  
Recent development of the international mainstream lithographic tools for 65 nm and 45 nm processes is described The key technologies to improve performance of lithographic tools are analyzed. The dominating types of lithographic tools as well as their performame parameters are reviewed. Development status of the next generation lithography is discussed briefly.
【Fund】: 国家自然科学基金资助课题(60578051)
【CateGory Index】: TN305.7
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