Full-Text Search:
Home|Journal Papers|About CNKI|User Service|FAQ|Contact Us|中文
《Laser Journal》 2008-06
Add to Favorite Get Latest Update

The controlling of photoresist thin film characteristic in the manufacturing of holographic grating mask

CHEN Nan-shu,HUANG Yuan-shen,ZHANG Da-wei(Optical & Electronic Information Engineering College,University of Shanghai for Science and Technology,Shanghai 200093,China)  
This article investigate the problem of how to control the characteristic of photoresist layer during the manufacturing process of the holographic grating mask.Making use of interference method and the calculated result of Stoney formula,the stress of photoresist thin film spinned on the SiOe substrate was studied.Meanwhile,the uniformity of film thickness was studied by microscope.Varying acceleration,rotating speed and spinning time,spinning experiment was done.The results shows that the residual stress of.photoresist thin film decrease,while the uniformity of thin film thickness get to the bad,with the reducing of acceleration at the same rotational speed.So choosing the parameters of spinning rightly during the manufacturing process of the holographic grating mask is indispensable.
【Fund】: 上海市科委课题上海市重点实验室登山计划“亚波长光栅防伪技术原理及关键技术研究”(编号06DZ22016);; 上海市科委课题(编号07DZ22026)“纳米尺度亚光波长结构材料成像与衍射特性研究平台建设”;; 上海市教委课题(编号06EZ011)”全息离子束刻蚀技术研究”项目资助
【CateGory Index】: O484.41
Download(CAJ format) Download(PDF format)
CAJViewer7.0 supports all the CNKI file formats; AdobeReader only supports the PDF format.
【Citations】
Chinese Journal Full-text Database 10 Hits
1 AN Bing,ZHANG Tong\|jun,YUAN Chao,CUI Kun ;Stress Measurement of Thin Films by Substrate Curvature Method[J];Materials Protection;2003-07
2 Zhao Jinsong1 Li Lifeng1 Wu Zhenhua2 1 Department of Precision Instruments, Tsinghua University, Beijing 100084 2 Department of Grating Research, Beijing Optical Instruments Factory, Beijing 101149;Method for Controlling Groove Depth and Duty Cycle of Rectangular Photoresist Gratings[J];Acta Optica Sinica;2004-09
3 FAN Rui ying, FAN Zheng xiu (Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China);Stress analysis of thin films and some testing results[J];Optical Instruments;2001-Z1
4 CHEN Xin-rong,GENG Kang,WU Jian-hong (Institute of Information Optical Engineering,Soochow University,Suzhou 215006,China);Nondestructive testing method for dielectric reflection grating[J];Laser Technology;2005-04
5 ZHAO Ji-de~1,LI Ying-liang~2,MA Chuan-long~2 1.Yantai Normal University,Yantai 264025,China;2.Huaxin Posts & Communications Consulting Designing Institute Co.,Ltd,Hangzhou 310014,China;Study of microscale effect of MEMS coplanar waveguide cavity structure[J];Laser Journal;2005-05
6 NI Min-xiong,ZHOU Jian-zhong,YANG Chao-jun,ZHANG Xing-quan,DU Jian-jun(School of Mechanical Engineering,Jiangsu University,Zhenjiang 212013,China);Analysis on residual stress field by laser shock Peening[J];Laser Journal;2006-05
7 CHEN Gang,WU Jian-hong,CHEN Xin-rong,LIU Quan(Institute of Information Optical Engineering,Suzhou University,Suzhou,Jiangsu 215006,China);Measurement of Profile Parameters of Holographic Photoresist Grating Mask Made on Top of Chrome Stack in Spectroscopic Way[J];Chinese Journal of Lasers;2006-06
8 ZHOU Wei-min,ZHOU Ping-nan,WU Ting-bing(School of Materials Science and Eng.,Shanghai Jiaotong Univ., Shanghai 200030,China);The Residual Stress Study of NiTi Thin Films by Nanoindentation[J];Research and Exploration in Laboratory;2007-01
9 WU Ping,QIU Hong,JIANG De-huai,ZHANG Bei,CHEN Sen,ZHAO Xue-dan,HUANG Xiao-ling(Physics Department,University of Science and Technology Beijing,Beijing 100083,China);Measurement of the stress in film using interference method[J];Physics Experimentation;2006-09
10 XU Xiang-Dong 1,2, HONG Yi-Lin 2FU Shao-Jun 2WANG Zhan-Shan 1 (1 Department of Physics, Tongji University, Shanghai 200092, China) (2 National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029,China);Holographic ion beam etched diffraction gratings[J];Physics;2004-05
【Co-citations】
Chinese Journal Full-text Database 10 Hits
1 Wei Songying Wu Yi Wang Ting Feng Tan Qian Huiguo(Zhejiang Normal University,Jinhua,321004);THE EXPERIMENT STUDY OF USING FILM RECORDER TO MAKE GRATING[J];Physical Experiment of College;2008-02
2 CHEN Nan-shu HUANG Yuan-shen ZHANG Da-wei(Optical & Electronic Information Engineering College,University of Shanghai for Science and Technology,Shanghai 200093,China);Controlling of Holographic Grating Mask Stress[J];Optics & Optoelectronic Technology;2008-06
3 CHEN Gang1,WU Jiang-hong2,LIU Quan2(1.Microelectronics Department,Nanjing Technology of Information Technology,Nanjing 210046,China)(2.Institute of Information Optical Engineering,Suzhou University,Suzhou 215006,China);Study on the profile evolution of the photoresist grating mask and its law[J];Optical Technique;2008-01
4 CHEN Gang1,WU Jiang-hong2,LIU Quan2,CHEN Xin-rong2,LI Chao-ming2(1.Microelectronics Department,Nanjing College of Information Technology,Nanjing 210046,China)(2.Institute of Information Optical Engineering,Suzhou University,Suzhou 215006,China);Simulation and experiments of monitoring curves on development of holographically recorded photoresist gratings[J];Optical Technique;2009-01
5 Lin Hua Li Lifeng Zeng Lijiang(State Key Laboratory of Precision Measurement Technology and Instruments,Department of Precision Instruments,Tsinghua University,Beijing 100084);Controlling the Duty Cycle of Photoresist Gratings by Setting the Guided-Wave Coupling Angles in Monitoring of Photoresist Development[J];Acta Optica Sinica;2006-05
6 Meng Xiangfeng Li Lifeng(State Key Laboratory of Precision Measurement Technology and Instruments,Department of Precision Instruments,Tsinghua University,Beijing 100084,China);Methods for Increasing Sidewall Steepness of Reactive Ion-Beam Etched,Sub-Micrometer-Period Gratings[J];Acta Optica Sinica;2008-01
7 CHEN Gang1,WU Jiang-hong2,LIU Quan2(1.Microelectronics Department,Nanjing College of lnformation Technology,Nanjing 210046,China;2.Institute of Information Optical Engineering,Suzhou University,Suzhou 215006,China);Influence of chromeplating to the profile of holographic grating mask of photoresist[J];Optical Instruments;2007-06
8 LIU Quan1,WAN Hua2,WU Jian-hong1,CHEN Xin-rong1,LI Chao-ming1(1 Institute of Information Optical Engineering,Soochow University,Suzhou 215006,China)(2 The 60th Institute of General Staff of the PLA,Nanjing 210016,China);Research on Acquisition of Low Gradient Photoresist Gratings[J];Acta Photonica Sinica;2008-07
9 Chen Guotai1,2,Xie Changqing1,Hu Xin3,Pan Yiming1,Zhu Xiaoli1,Liu Ming1,Wu Xiulong2,Chen Junning2(1.Key Lab of Nano-Fabrication and Novel Devices Integrated Technology,Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029,China;2.School of Electronic Science and Technology,Anhui University,Hefei 230039,China;3.Research Center of Laser Fusion,China Academy of Engineering Physics,Mianyang 621900,China);Fabrication of Multi-Energy Point X-Ray Transmission Gratings[J];Micronanoelectronic Technology;2010-01
10 WANG Hua-qing, XUE Wei, LU Wei-qiang, LI Xia, ZHANG Nan (Thin Film and Display Lab, Beijing Institute of Technology, Beijing 100081, China);On-line thin-film stress measurement system based on Hartmann-Shack sensor technique[J];Infrared and Laser Engineering;2009-01
China Proceedings of conference Full-text Database 1 Hits
1 LIU Quan a,b, WAN Huac, WU Jianhong a,b, CHEN Xinrong a,b, LI Chaoming a,b a Institute of Information Optical Engineering, Soochow University, Suzhou, China, 215006 b Jiangsu Province Key Laboratory of Modern Optical Technology, Soochow University, Suzhou, China, 215006 c The 60th Institute of General Staff of the PLA, Nanjing, China, 210016;Study on the Fabrication of Low Gradient Photoresist Grating Masks[A];[C];2007
【Secondary Citations】
Chinese Journal Full-text Database 10 Hits
1 ZHU Chang-chun,ZHAO Hong-po,HAN Jian-qiang,CUI Wan-zhao (Institute of Vacuum Microelectronics,School of Electronics and Information Engineering,Xian Jiaotong University,Xian710049,China);The residual stresses in MEMS thin films[J];Micronanoelectronic Technology;2003-10
2 WU Ping,QIU Hong,HUANG Xiao-ling,TIAN Yue,ZHAO Xue-dan,PAN Li-qing,WANG Feng-ping,LUO Sheng(Department of Physics,School of Applied Science,University of Science and Technology Beijing,Beijing 100083,China);A group of experiments of metal film preparation and physical property measurement[J];College Physics;2006-05
3 XIONG Sheng ming 1, ZHANG Yun dong 1, TANG Jin fa 2 (1.Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China;2.Department of Opto Electronics Information Engineering,Zhejiang University, Hangzhou 310027, China;The Stress Properties of Oxide Thin Films Prepared by Reactive Electron Beam Evaporation[J];Opto-electronic Engineering;2001-01
4 LI Wei SHI Yanling XIN Peishe ng ZHU Ziqiang LAI Zongsheng (Department of E.E., East Ch ina Normal University, Shanghai, 200062, CHN);Loss Performance of CPW with Thick Polyimide on Low-resistivity Si[J];Research & Progress of Solid State Electronics;2003-03
5 XIANG Peng, JIN Chun-shui (State Key Lab of Applied Optics, Changhcun Institute of Optics and Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130022, China);Measurement of residual stress in molybdenum/silicon multilayer coat ings[J];Optics and Precision Engineering;2003-01
6 Yang Hong; Lin XiangZhi; Cui Xiaoming; Liu Zhiyang; An Honglin; Liu Yongen; Liu Hongdu (Department of Physics, Peking University and State Key Labs of Mesoscopic Phusics, Beijing 100871);Single Mode Optical Fibre Bragg Reflective Filter[J];ACTA OPTICA SINICA;1994-04
7 Wang Zhanshan Ma Yueying Lu Junxia Gao Honggang Liu Yinan Pei Shu Cao Jianlin (State Key Laboratory of Applied Optics, Changchun Institute of Optics and Fine Mechanics, The Chinses Academy of Sinica, Changchun 130022) Xu Xiangdo;Experimental Investigation of X Ray Bragg Fresnel Optics[J];ACTA OPTICA SINICA;1999-07
8 ang Biyu,Jin Jiucheng ,Li Shaolu , Zhou Lingping ,Chen Zongzhang (Department of Chemistry and Chemical Engineering,Hunan University, Changsha 410082) (Material Test and Research Center,Hunan University,Changsha 410082);STUDY ON STRESS IN CHEMICAL VAPOR DEPOSITE(CVD) DIAMOND FILMS[J];CHINESE JOURNAL OF HIGH PRESSURE PHYSICS;1997-01
9 DUAN Yu-gang,DING Yu-cheng,LU Bing-heng,WANG Li-yong(Institute of Advanced Manufacture Technology,Xi’an Jiaotong Unive rsity,Xi’an 710049,China);The Research of Photo-carable and Imprint Lithography for Integrate Circuit Chip[J];Machine Tool & Hydraulics;2004-12
10 WANG Cheng ZHANG Guiyan MA Ying XIAO Mengchao QIAN Longsheng (Changchun Institute of Optics, Fine Mechanics and Physics, The Chinese Academy of Sciences, Changchun 130022);Study of Thin Film Stress Measurements[J];Laser & Optronics Progress;2004-09
©2006 Tsinghua Tongfang Knowledge Network Technology Co., Ltd.(Beijing)(TTKN) All rights reserved