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《Chinese Journal of Lasers》 2006-05
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Influence of Technological Conditions of Deposition Process on Microstructure of Thin Films

TIAN Guang-lei~(1,2),SHEN Yan-ming~(1,2),SHEN Jian~(1,2),SHAO Jian-da~1,FAN Zheng-xiu~1~1Shanghai Institute of Optics and Fine Mechanics,The Chinese Academy of Sciences,Shanghai 201800,China~2Graduate School of the Chinese Academy of Sciences,Beijing 100039,China  
Thin films of ZrO_2,HfO_2 and TiO_2 were deposited on several kinds of substrates such as fused silica,YAG,K9 and LiNbO_3;HfO_2 films were prepared by electron beam(EB) evaporation,ion assisted deposition(IAD) and dual ion beam sputtering(DIBS);then some of them were annealed at different temperatures.X-ray diffraction(XRD) was applied to gain the crystalline phase and the size of crystal grain of these thin films,and the results revealed that their crystallographic structure strongly depended on the technological conditions of the deposition process such as substrate category,deposition temperatures,deposition methods and annealing temperatures.The theory of films growth and diffusion is used to explain the difference of crystallographic structures between these thin films deposited and treated under various conditions.
【Fund】: 上海市光科技项目(036105007)资助课题
【CateGory Index】: O484.1
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