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《Journal of Geology》 2009-03
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Discussions on genesis mechanism of crystal deposit in Donghai of Jiangsu

ZHENG Da-zhong,ZHENG Ruo-feng(Chengdu Synthetic Testing Center of Rocks and Minerals,Chengdu 610081,China)  
Through studies of silicon migration forms and conditions,chemical components of crystal fluid inclusion in Donghai crystal deposit,affinity of drusy cavity and crystal as well as the coexisting minerals and associated minerals of crystal,the authors brought forward the genetic mechanism of crystal deposit: under conditions of reduction hydrogen-rich environment of high temperature and pressure in the depth of the earth,silicon was activated and purified in a mode of gaseous silicon-hydrogen complex and migrated upto shallow crust that was under a environment of low temperature and pressure,silicon oxide was oxidized rapidly and formed crystal veins,crystal crust(drusy cavity) was formed along favorable portions,silicon hydride in the drusy cavity was oxidized smoothly under warm and stable environment,the crystal deposit was formed through free crystallization,differentiation and purification of the silicon hydride.
【CateGory Index】: P619.281
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