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《JOURNAL OF SUZHOU INSTITUTE OF SILK TEXTILE TECHNOLOGY》 1998-03
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INVESTIGATION OF MATERIALS PROCESSED WITH THE MICROWAVE ECR PLASMA

Ye Chao(physics,Science & Techn.College Suzhou University,215006)  
お? Recently,microwave electron cyclotron resonance(ECR) plasma has been used in depositing films, processing materials and synthesizing organic polymer. In this paper, some new applications and developing are introduced, including our some new experimental results.
【CateGory Index】: O59
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【Citations】
Chinese Journal Full-text Database 3 Hits
1 YE Chao; NIVG Zhaoyuan; GAN Zhaoqiang(Thin Film Material Laboratory, Physics Departrment of Suzhou University. Suzhou 215006);EXPERIMENTAL INVESTIGATION OF PLASMA CHARACTERISTICS IN AN AXIAL TWO POLE FLELD MWECR-CVD SYSTEM[J];NUCLEAR FUSION AND PLASMA PHYSICS;1995-04
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【Co-citations】
Chinese Journal Full-text Database 10 Hits
1 Yin Shengyi,Chen Guanghua,Wu Yueying,Wang Qing,Liu Yi,Zhang Wenli, Song Xuemei and Deng Jinxiang(Department of Materials Science and Engineering,Beijing University of Technology,Beijing 100022,China)[WT5”HZ];MWECR-CVD System with a New Magnetic Field and Deposition of a-Si∶H Films[J];Chinese Journal of Semiconductors;2004-05
2 HUANG Feng, CHENG Shan\|hua, NING Zhao\|yuan, YANG Shen\|dong, YE Chao,GAN Zhao qiang (Department of Physics,Suzhou University,Suzhou,215006,China);The Influence of Microwave Power on the Structure and the Optical Property of a-C:F Thin Film[J];Materials Science and Engineering;2001-04
3 Ye Chao Ning Zhaoyuan Wang Hao Shen Mingrong Gan Zhaoqiang (Laboratory of Films Materials,Physics Science and Techonlogy Institute,Suzhou University,Suzhou,215006,China);Hydrogen Content of SiN_x Films Deposited by ECR-CVD at Low Temperature[J];Journal of Functional Materials;1998-01
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6 Ye Chao Ning Zhaoyuan Xiang Suliu  Shen Mingrong Wang Hao Gan Zhaoqiang Film Materials Laboratory, Province of Jiangsu, Suzhou University, Suzhou 215006  Testing & Analysis Center, Suzhou University, Suzhou 215006 (Received 23;Optical Properties of SiN x Films Prepared by Microwave ECR CVD[J];ACTA OPTICA SINICA;1997-04
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