PHOTORESPONSE OF POLYCRYSTALLINE ZnO FILMS DEPOSITED BY RF SPUTTERING AND THEIR STRUCTURAL RELAXATION
ZHANG DE-HENG(Department of Physics, Shandong University, Jinan 250100)D. E. B0_(RODIE)(Department of Physics, University of Waterloo, Waterloo, Ont., Canada, N2L 3G1)
The photoresponse of polycrystalline ZnO films deposited by r. f. sputtering at a high oxygen pressure consists of two parts. The first part of photoresponse originates from photodesorption of adsorbed oxygen on the interface of crystallites of the ZnO films. This part of photoresponse increases the conductivity of the films by 2 orders of magnitude and the response speed is relatively fast. The second part of photoresponse is due to photodesorption of adsorbed oxygen on the surface of the films. This photoresponse increases the conductivity of the films by 4-5 orders of magnitude and the response speed is very slow, these two parts of photorespon-seall originate from structural changes of the films and the structural changes depend on ambient gases, gas pressure and temperature of the samples.
【CateGory Index】： O484.41