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《Acta Physica Sinica》 2005-09
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Fabrication of graphite nano-structures

Liu Shou-Peng1) Zhou Feng1)Jin Ai-Zi1) Yang Hai-Fang1) Ma Yong-Jun1) Li Hui1) Gu Chang-Zhi1) Lü Li1) Jiang Bo2) Zheng Quan-Shui2) Wang Sheng3) Peng Lian-Mao3) 1) (Beijing National Laboratory for Condensed Matter Physics, and the Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China) 2) (Department of Engineering Mechanics, Tsinghua University, Beijing 100084, China) 3) (Department of Electronics, Peking University, Beijing 100871, China)  
Nano-sized graphite patterns were obtained by tailoring graphite sheets using different methods. With focused ion beam etching we are able to produce grooves of minimum width ~ 30 nm. However, at the edges of the grooves there deposit with Ga-C compound which prevents the easy cleavage of the graphite sheets. With electron beam lithography and reactive ion etching techniques we are able to produce graphite patterns of sizes down to 50 nm. Three different types of masks are tested, and the results are compared and discussed.
【CateGory Index】: TB383
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