Full-Text Search:
Home|Journal Papers|About CNKI|User Service|FAQ|Contact Us|中文
《Acta Physica Sinica》 2014-18
Add to Favorite Get Latest Update

Simulations of electrical asymmetry effect on N_2-H_2 capacitively coupled plasma by particle-in-cell/Monte Carlo model

Hao Ying-Ying;Meng Xiu-Lan;Yao Fu-Bao;Zhao Guo-Ming;Wang Jing;Zhang Lian-Zhu;College of Physics Science and Information Engineering,Hebei Normal University;  
A N_2-H_2 capacitively coupled rf discharge has potential applications in etching of organic low dielectric constant(low-k) material for microelectronics technology.In this paper,we investigate the characteristic and electrical asymmetry effect(EAE) on the N_2-H_2 capacitively coupled plasma used for low-k material etching by particle-in-cell/Monte Carlo(PIC/MC) model,in which the two frequency sources of 13.56 MHz and 27.12 MHz are applied separately to the two electrodes in geometrically in symmetry.It is found that the plasma density profiles,the ion flux density profiles and the energy distribution of ion bombarding electrodes can be changed by adjusting the phase angle θ between the two harmonics.When the phase angle θ is 0°,the density of primary ion(H3+) near low frequencie electrode(LFE)(wafer)is smallest,whereas flux and average energy of ion(H~+,H_3~+,H_2~+) bombarding LFE are biggest;if the phase angle θ is tuned from 0° to 90°,the dc self-bias increases almost linearly from-103 V to 106 V,ion flux bombarding the LFE decreases by±18%,the maximum of the ion bombarding energy at the LFE decreases by a factor of 2.5.For the N_2-H_2capacitively coupled rf discharge,for the case of two frequencies(13.56 MHz/27.12 MHz) applied separately to the two electrodes,can realize separate control of ion energy and flux via the EAE,and is generally in qualitative agreement with experimental and modeling investigation on the Ar and O_2 plasma for a dual-frequency voltage source of 13.56 MHz and 27.12 MHz is applied to the powered electrode.This work supplies a references basis for experimental research and technology that the EAE on the H_2-N_2 plasmas is used for organic low-k material etching process.
【Fund】: 河北省自然科学基金(批准号:A2012205072)资助的课题~~
【CateGory Index】: O53
Download(CAJ format) Download(PDF format)
CAJViewer7.0 supports all the CNKI file formats; AdobeReader only supports the PDF format.
【Citations】
Chinese Journal Full-text Database 3 Hits
1 ZHANG Lianzhu;YAO Fubao;ZHAO Guoming;HAO Yingying;SUN Qian;College of Physics Science and Information Engineering,Hebei Normal University;;Effect of Addition of Nitrogen to a Capacitively Radio-Frequency Hydrogen Discharge[J];Plasma Science and Technology;2014-03
2 Zhang Lian-Zhu Meng Xiu-Lan Zhang Su Gao Shu-Xia Zhao Guo-Ming ( College of Physics Science and Information Engineering, Hebei Normal University, Shijiazhuang 050024, China );Simulation of N_2 microhollow cathode discharge and cathode sputtering by using a PIC/MC model[J];物理学报;2013-07
3 Jiang Xiang-Zhan~(1)2)Liu Yong-Xin~(1)Bi Zhen-Hua~(1)LuWen-Qi~(1)Wang You-Nian~(1)+) 1)(School of Physics and Optoelectronic Technology,Dalian University of Technology,Dalian 116024,China) 2)(Xinjiang Ploytechnical College,Urumqi 830091,China);Radial density uniformity of dual frequency capacitively coupled plasma[J];物理学报;2012-01
【Co-citations】
Chinese Journal Full-text Database 5 Hits
1 Yang Wang;Liu Xueping;Xia Huanxiong;Xiang Dong;Mou Peng;Graduate School at Shenzhen,Tsinghua University;Department of Mechanical Engineering,Tsinghua University;;Simulation of Discharge Characteristics of Capacitively Coupled Plasma[J];真空科学与技术学报;2015-06
2 Hao Ying-Ying;Meng Xiu-Lan;Yao Fu-Bao;Zhao Guo-Ming;Wang Jing;Zhang Lian-Zhu;College of Physics Science and Information Engineering,Hebei Normal University;;Simulations of electrical asymmetry effect on N_2-H_2 capacitively coupled plasma by particle-in-cell/Monte Carlo model[J];物理学报;2014-18
3 HE Shoujie;LIU Shumin;LIU Zhiqiang;College of Physics Science and Technology,Hebei University;;Cylindrical Micro-hollow Cathode Discharge at Atmospheric Pressure[J];高电压技术;2013-09
4 Du Yong-Quan;Liu Wen-Yao;Zhu Ai-Min;Li Xiao-Song;Zhao Tian-Liang;Liu Yong-Xin;Gao Fei;Xu Yong;Wang You-Nian;Laboratory of Plasma Physical Chemistry,Dalian University of Technology;School of Physics and Optoelectronic Technology,Dalian University of Technology;;Phase resolved optical emission spectroscopy of dual frequency capacitively coupled plasma[J];物理学报;2013-20
5 GAO Shuxia,ZHANG Su,MENG Xiulan,ZHANG Lianzhu(College of Physics Science and Information Engineering,Hebei Normal University,Shijiazhuang 050024,China);Numerical simulation of Titanium Cathode Sputtering in Nitrogen Microhollow Cathode Discharge[J];计算物理;2013-03
【Secondary Citations】
Chinese Journal Full-text Database 4 Hits
1 Xia Guang-Qing 1) Xue Wei-Hua1) Chen Mao-Lin2) Zhu Yu3) Zhu Guo-Qiang3) 1) (School of Aeronautics and Astronautics,State Key Laboratory of Structural Analysis for Industrial Equipment, Dalian University of Technology,Dalian 116024,China) 2) (School of Astronautics,Northwestern Polytechnical University,Xi’an 710072,China) 3) (Laboratory on Plasma and Conversion of Energy(LAPLACE),Paul Sabatier University,Toulouse 31062,France);Numerical simulation study on characteristic parameters of microcavity discharge in argon[J];物理学报;2011-01
2 ZHAO Shu-xia,ZHANG Lian-zhu(College of Physics Science and Information Engineering,Hebei Normal University,Shijiazhuang 050016);PIC/MCC simulation of the plasma dynamics in nitrogen glow discharge[J];核聚变与等离子体物理;2009-01
3 XIA Guang-qing1,MAO Gen-wang1,Nader Sadeghi2(1.College of Astronautics,Northwestern Polytechnical University,Xi'an 710072,China;2.LSP,Joseph Fourier University &CNRS,38041 Grenoble,France);A novel microplasma thruster using microhollow cathode discharge[J];固体火箭技术;2008-06
4 Qiu Liang Meng Yue-Dong Ren Zhao-Xing Zhong Shao-Feng(Institute of Plasma Physics,Chinese Academy of Sciences,Hefei 230031,China);A new atmospheric RF cold plasma source with microhollow cathode structure[J];物理学报;2006-11
©2006 Tsinghua Tongfang Knowledge Network Technology Co., Ltd.(Beijing)(TTKN) All rights reserved