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《MICROFABRICATION TECHNOLOGY》 1999-04
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Model of laser energy absorption in photoresist for laser direct writing

GAO Fu hua; DU Jing lei, YAO Jun, ZHANG Yi xiao, GUO Yong kang (Dept. Of physics, Sichuan University, Chengdu 610064, China)  
Model of laser energy absorption in photoresist is an important model for laser direct writing system. It is the necessary basis for simulation of proximity effect and achievment of proximity correction. In this paper, we analyse the main factors that affect the laser energy absorption in photoresist and present a model of laser energy absorptiont. The experiments show that this model can describe the actual density distribution of laser energy absorbed by photoresist more precisely. It can provide reliable evidence for the proximity correction in laser direct writing as well as the simulation of photolithography process in fabricating micro optic elements.
【Fund】: 国家自然科学基金;;教育部博士点基金;;中科院光电所国家重点实验室的资助
【CateGory Index】: TN305.7
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【References】
Chinese Journal Full-text Database 1 Hits
1 SUN Yan-jun,LENG Yan-bing,CHEN Zhe,DONG Lian-he(The School of photo-electronic engineering,Changchun University of Science and Technology,changchun 130022,China);Study on Optical Property of Fabricating Silicon-based Free-form Micro-lens Array[J];红外技术;2012-01
【Citations】
Chinese Journal Full-text Database 2 Hits
1 Du Jinglei Huang Qizhong Yao Jun Zhang Yixiao Guo Yongkang (Physics Department, Sichuan University, Chengdu 610064) Qiu Chuankai (State Key Lab. of Optical Technology on Microfabrication, Institute of Optics and Electronics, The Chines;Optical Proximity Correction in Laser Direct Writing[J];光学学报;1999-07
2 Du Jinglei Huang Qizhong Yao Jun Su Jingqin Guo Yongkang (Physics Departments, Sichuan University, Chengdu 610064) Cui Zheng (Rutherford Appleton Laboratory, U.K.) Shen Feng (Institute of Optics and Electronics, The Chinese Academ;OPC with Grey Level Mask and Its Computer Simulation Study[J];光学学报;1999-05
【Co-citations】
Chinese Journal Full-text Database 10 Hits
1 SHI zhao-jun;LI Qi-shen;ZHANG Sheng;Key Laboratory of Jiangxi Province for Image Processing and Pattern Recognition,Nanchang Hangkong University;School of Information Engineering,Nanchang Hangkong University;;Optimizing Pixel Gray to Improve the Imaging Quality of Digital Lithography[J];南昌航空大学学报(自然科学版);2017-03
2 He Jun;Liu Shijie;Wang Bin;Guo Meng;Wang Yueliang;Key Laboratory of Materials for High Power Laser,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences;University of Chinese Academy of Sciences;;Mask optimization in proximity lithography of thick resist[J];强激光与粒子束;2015-07
3 Song Jing Geng Yongyou(Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China);Preparation of Polyvinyl Alcohol(PVA)/Siver(Ag)Nanocomposite Film Applied in Laser Direct Writing of Blue Ray(405nm)[J];光学学报;2012-09
4 ZHANG Shan1,WANG Lei2(1.Department of Electrical Engineering & Information Technology,Shandong University of Science & Technology,Jinan 250031,China;2.Institute of Ultra-precision Optical & Electronic Instrument Engineering,Harbin Institute of Technology,Harbin 150001,China);Optical Proximity Correction for Low Resolution Acoustooptic Modulator[J];光电工程;2012-04
5 Guo Xiaowei~(1,2) Du Jinglei~1 Liu Yongzhi~11 School of Optoelectronic Information, University of Electronic Science and Technology,Chengdu, Sichuan 610054, China2 Physics Department, Sichuan University, Chengdu, Sichuan 610064, China;Improving the Profiles of Imaging Patterns by Optimizing Mask in DMD-Based Maskless Photolithography[J];光学学报;2009-03
6 ;Research on Digital Projection Step Lithography[J];中国仪器仪表;2008-12
7 Guo Xiaowei1, Du Jinglei1, Luo Boliang1, Guo Yongkang 1, Du Chunlei2 1 Institute of Information Optics, Sichuan University, Chengdu 610064 2 Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 6102 09;Imaging Model for DMD-Based Gray-tone Lithography System[J];光子学报;2006-09
8 XU Bing, WEI Guo-jun, CHEN Lin-sen(Institute of Information Optical Engineering, Soochow University, Suzhou 215006, China);Research Advances in Technology of Laser Direct Writing[J];光电子技术与信息;2004-06
9 Li Fengyou 1,2, Xie Yongjun 2, Sun Qiang 1,2,Cao Zhaoliang 2, Lu Zhenwu 2, Wang Zhaoqi 1 1 Institute of Modern Optics, Nankai University, Tianjin 300071 2 State Key Lab of Applied Optics,Changchun Institute of Optics, Fine Mechanics and Physics, The Chinese Academy of Sciences, Changchun,Jilin 130022;Analyzing of Line Profile for Laser Direct Writing Lithography[J];光子学报;2004-02
10 Shao Jie Chen Linsen (Information Optical Engineering Institute, Suzhou University, Suzhou 215006, China);Improved ways of making OVDs with interferential laser direct writing technique[J];仪器仪表学报;2003-06
【Co-references】
Chinese Journal Full-text Database 7 Hits
1 SUN Yan-jun,LENG Yan-bin,DONG Lian-he(The School of photo-electronic engineering,Changchun University of Science and Technology,changchun 130022,China);Study on Antireflective Relief Periodic Structure of Sapphire Infrared Window[J];红外技术;2011-02
2 ZHANG Shan,TAN Jiu-bin,WANG Lei,JIN Zhan-lei(Institute of Ultra-precision Optical & Electronic Instrument Engineering,Harbin Institute of Technology,Harbin 150001,China);Dynamic exposure model of laser direct writing in Cartesian coordinate[J];光学精密工程;2008-08
3 CHEN Bo-liang (Shanghai Institute of Technical Physics, Chinese Academy of Sciences ,Shanghai 200083,China);Important applications of IRFPA imaging devices[J];红外与激光工程;2005-02
4 Li Fengyou 1,2, Xie Yongjun 2, Sun Qiang 1,2,Cao Zhaoliang 2, Lu Zhenwu 2, Wang Zhaoqi 1 1 Institute of Modern Optics, Nankai University, Tianjin 300071 2 State Key Lab of Applied Optics,Changchun Institute of Optics, Fine Mechanics and Physics, The Chinese Academy of Sciences, Changchun,Jilin 130022;Analyzing of Line Profile for Laser Direct Writing Lithography[J];光子学报;2004-02
5 LI Feng you 1, LU Zhen wu 1, ZHANG Dian wen 1, LI Hong jun 1, ZHAO Jing li 2, CONG Xiao jie 1, WENG Zhi cheng 1 (1.State Key Lab.of Applied Optics,Changchun Institute fo Optics and Fine Mechanics & Physics,Chinese Academy of Science; 2.Seve;Fabrication Techniques by Using Laser Direct Writing System[J];光电子·激光;2001-09
6 FENG Zhijing, WU Hongzhong, ZHAO Guangmu, CHEN Zuojun (Department of Precision Instruments and Mechanology, Tsinghua University, Beijing 100084, China);Correcting the accuracy of non rotating and aspheric lens by controlling the pressure of the polishing die[J];清华大学学报(自然科学版);2000-08
7 GAO Fu hua; DU Jing lei, YAO Jun, ZHANG Yi xiao, GUO Yong kang (Dept. Of physics, Sichuan University, Chengdu 610064, China);Model of laser energy absorption in photoresist for laser direct writing[J];微细加工技术;1999-04
【Secondary References】
Chinese Journal Full-text Database 7 Hits
1 YIN Hang;DONG Lianhe;SONG Xuan;CHEN Zhe;School of Optoelectronic Engineering,Changchun University of Science and Technology;;Research on the Process of Fabricating Micro-cylindrical Lens on a Spherical Substrate[J];长春理工大学学报(自然科学版);2014-06
2 SHI Guang-feng;YANG Bin;SHI Guo-quan;XU Yuan-zhe;College of Mechanical and Electric Engineering, Changchun University of Science and Technology;;A Review of the Development of High-speed Liquid Lens[J];红外技术;2014-10
3 YOU Yue;WANG Qiao-fang;ZI Zheng-hua;Kunming Institute of Physics;;A Test Technique of Surface Shape Aspheric Optics Parameters Based on Matlab[J];红外技术;2014-04
4 SUN Yan-jun;CHEN Zhe;LENG Yan-bin;DONG Lian-he;The School of photo-electronic engineering,Changchun University of Science and Technology;;Study on the Integration of Square Aperture Spherical Micro-lens Arrays and Infrared Focal Plane[J];红外技术;2014-03
5 SUN Yanjun;CHEN Zhe;LENG Yanbin;DONG Lianhe;School of Photo-electronic Engineering,Changchun University of Science and Technology;;Study on Integration of Square Aperture Spherical Micro-lens Arrays and Infrared Focal Plane[J];半导体光电;2013-06
6 YAN Hui-min 1,GUO Ying 1,ZHU Hua-xin 1,LIU Gui-lin 2,ZHU Bing-jie 1,LI Shuai 1,LI Guo-hua 1,3 (1. School of Science,Jiangnan University,Wuxi 214122,China; 2. School of Internet of Things,Jiangnan University,Wuxi 214122,China; 3. Jiangsu (Suntech) Institute for Photovoltaic Technology,Wuxi 214028,China) (Received 21 December 2012,accepted 14 January 2013);Comparison between Wet Film and Dry Film Photolithography Fabrication of ITO Electrode[J];人工晶体学报;2013-06
7 CHEN Yu(The School of electronic information,Changchun University of Science and Technology,Changchun 130022,China);Study on Electromagnetic Shielding of Infrared /Visible Optical Window[J];红外技术;2012-07
【Secondary Citations】
Chinese Journal Full-text Database 1 Hits
1 Du Jinglei; Huang Qizhong; Huang Xiaoyang; Guo Yongkang; Cui Zheng(Department of Physics, Sichuan University, Chengdu, 610064) (U. K. Rutherford Lob);A New Method for Optical Proximity Correction[J];应用激光;1997-06
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