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《Chinese Journal of Liquid Crystals and Displays》 2006-06
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Improvement of Cr-mask Cleaning

ZHANG Jin-long,JING Hai,MA Kai(North Liquid Crystal Engineering Research and Development Center,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun 130031,China)  
Cr-mask of CSTN-LCD was cleaned by mask-cleaning machine.The cause of scraping of Cr-layer broke off from Cr-mask in cleaning was analyzed.It depends heavily on axial spray press and horizontal circumferential force.With adjusting rev and spray press,it was found out that the secure conditions of manipulating mask-cleaning machine were the rev not more than 1 000 r/min and the spray press less than 0.5×105 Pa.It is necessary to fulfil requirement of clean by the means of pre-cleaning.The average conversion time was shorten from 3 h to 1 h.The throughput was increased by 270 000 sheets.
【Fund】: 国家自然科学基金资助项目(No.60576056)
【CateGory Index】: TN873.93
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