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《Journal of Applied Optics》 2008-02
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Effect of acid etching on electrical performances of microchannel plate

SUN Zhong-wen,HUANG Yong-gang,JIA Jin-sheng,HUANG Ying,LIU Shu-ci,LIU Hui,LI Guo-en(China Building Materials Academy,Beijing 100024,China)  
Scanning electron microscope(SEM),Rutherford backscattering(RBS),atomic force microscope(AFM),energy dispersive spectrometer(EDS),photometer and microchannel plate(MCP) tester were used to investigate the effect of acid-etched time on electron gain,bulk resistance,noise current density,electron image brightness of MCP from the surface composition,morphology and structure of cladding glasses.The results show that the electrical performances of MCP is dependent on acid etching time.The electron gain and image brightness reach their maximum after the acid etching of 120 min.The bulk resistance reduces to a certain value and then keeps constant with the increase of the acid-etched time.The noise current density,however,increases with the etching time.
【Fund】: 国家“863计划”项目资助(2006AA03A208)
【CateGory Index】: TN15
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