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《Vacuum》 2006-04
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Atomic layer deposition and its applications in semiconductor

SHEN Can,LIU Xiong-ying,HUANG Guang-zhou(College of Electronic and Information Engineering,South China University of Technology,Guangzhou 510640,China)  
The miniaturization of semiconductor devices accelerates the development of atomic layer deposition(ALD) technology.Reviews the advantages of ALD in uniformity and conformality by analyzing its complementarity and self-limitation.ALD has many potential applications in semiconductor such as interconnection,gate dielectric,capacitors etc.But,some problems are found to be solved in ALD technology at present.
【Fund】: 广东省自然科学基金(B06-6050600);; 华南理工大学自然科学基金(B605E5050410);; 广东省重点科技攻关课题(2KB0240G)
【CateGory Index】: TN304.05
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