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《中国有色金属学报(英文版)》 2015-03
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Microstructure and high temperature oxidation resistance of Si-Y co-deposition coatings prepared on TiAl alloy by pack cementation process

Yong-quan LI;Fa-qin XIE;Xiang-qing WU;School of Materials Science and Engineering,Beifang University of Nationalities;School of Aeronautics,Northwestern Polytechnical University;  
In order to improve the high temperature oxidation resistance of TiAl alloy,Y modified silicide coatings were prepared by pack cementation process at 1030,1080 and 1130 ℃,respectively,for 5 h.The microstructures,phase constitutions and oxidation behavior of these coatings were studied.The results show that the coating prepared by co-depositing Si-Y at 1080 ℃ for 5 h has a multiple layer structure:a superficial zone consisting of Al-rich(Ti,Nb)_5Si_4 and(Ti,Nb)_5Si_3,an out layer consisting of(Ti,Nb)Si_2,a middle layer consisting of(Ti,Nb)_5Si_4 and(Ti,Nb)_5Si_3,and a γ-TiAl inner layer.Co-deposition temperature imposes strong influences on the coating structure.The coating prepared by Si-Y co-depositing at 1080 ℃ for 5 h shows relatively good oxidation resistance at1000 ℃ in air,and the oxidation rate constant of the coating is about two orders of magnitude lower than that of the bare TiAl alloy.
【Fund】: Project(2014JZ012)supported by the Natural Science Program for Basic Research in Key Areas of Shaanxi Province China
【CateGory Index】: TG174.4
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