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《Micronanoelectronic Technology》 2017-02
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Surface Light Trapping Structure Based on ReactionDiffusion Etching for Solar Cells

Zhao Zhouxing;Wang Qingkang;Liu Daiming;Key Laboratory for Thin Film and Microfabrication Technology of Ministry of Education,Shanghai Jiao Tong University;  
A fabrication process for the fabrication of the light trapping array structure via the isotropic etching method by patterning the Cr/Cu mask layer on the glass substrate surface with reaction diffusion etching was presented.The reflectance of light can be reduced and the photonto-electron conversion efficiency of the solar cells can be enhanced with the light trapping structure applied to the surface of the silicon laminated thin film solar cells.The experimental result shows that within the wavelength range of 350-1 100 nm,the photon-to-electron conversion efficiency of the solar cells can be enhanced up to 10.08%,which is relatively 3.07%larger than that of the laminated thin film solar cells with the smooth glass.Simultaneously,the average reflectance of the glass surface reduces from9.13%to 8.87%,and the average transmission haze of the prepared glass sheet with the surface of the tub-shape micro-pit array structure is up to49.45%.The test result indicates that the average surface reflectance of the cells tub array structure reduces to 22.28%from27.15% by covering the crystalline silicon on the tub-shape micropit array structure.The proposed fabrication method for the light trapping array structure on the glass via the reaction-diffusion etching process can be widely used as an antireflection structure of the silicon laminated thin film solar cell to enhance the solar cell efficiency.
【Key Words】: solar cell antireflection characteristic reaction-diffusion etching light trapping structure reflectance
【Fund】: 国家高技术研究发展计划(863计划)资助项目(2011AA050518)
【CateGory Index】: TM914.4
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