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《Glass》 2016-01
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Design of Supporting End of Rotating Cathode

Chen Cheng;Zhong Rumei;Liu Yuebao;Ren Dan;Bengbu Hua-yi conductive film glass Co., Ltd.;  
Supporting end structure design of rotating cathode for magnetron sputtering was described. This designed structure can increase target utilization rate(80% or more), avoid deposit on non-sputtering area, reduce the non-sputtering area of vacuum coating by 60% and overcome the shortcomings of high cost and inferior quality of rectangular flat cathode.
【CateGory Index】: TB306
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