Full-Text Search:
Home|About CNKI|User Service|中文
Add to Favorite Get Latest Update

Design of Supporting End of Rotating Cathode

Chen Cheng;Zhong Rumei;Liu Yuebao;Ren Dan;Bengbu Hua-yi conductive film glass Co., Ltd.;  
Supporting end structure design of rotating cathode for magnetron sputtering was described. This designed structure can increase target utilization rate(80% or more), avoid deposit on non-sputtering area, reduce the non-sputtering area of vacuum coating by 60% and overcome the shortcomings of high cost and inferior quality of rectangular flat cathode.
Download(CAJ format) Download(PDF format)
CAJViewer7.0 supports all the CNKI file formats; AdobeReader only supports the PDF format.
©CNKI All Rights Reserved