Design of Supporting End of Rotating Cathode
Chen Cheng;Zhong Rumei;Liu Yuebao;Ren Dan;Bengbu Hua-yi conductive film glass Co., Ltd.;
Supporting end structure design of rotating cathode for magnetron sputtering was described. This designed structure can increase target utilization rate(80% or more), avoid deposit on non-sputtering area, reduce the non-sputtering area of vacuum coating by 60% and overcome the shortcomings of high cost and inferior quality of rectangular flat cathode.
【CateGory Index】： TB306