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《Materials Review》 2007-S2
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Research on MW-CVD Diamond film Nucleation

HUANG Jianliang,WANG Jianhua (Province Key Laboratory of Plasma Chemistry and Advanced Material,Wuhan University of Eng ineering, Wuhan 430073; Institute of Plasma Physics of the Chinese Academy of Sciences.Hefei 230031)  
The density and quality of microwave chemical vapor deposited CVD diamond film studied using Mo, Ni,Fe substrates. It is discover that by using high-power, high-temperature hydric plasma (3000W,air pressure is 8.0kPa,flux of H2 is 100sccm,900℃,disposing 10~15min) and by plating compound transitional layers on underlay, carbon to graphite reactions can be restrain, at low temperature and atmospheric pressure,and that the binding energy between the film and the substrate is improved. Invariably, the density and quality of nucleated diamond films are improved through microwave-plasma processing.
【Fund】: 湖北省高等学校优秀中青年团队项目
【CateGory Index】: O484.1
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