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《Information Recording Materials》 2007-01
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A Nitrogen Plasma Light Source Stimulated by RF Electrodeless Field Discharge for CTCP Technology in Printing

LI Chao-Yang,CHEN qiang,ZHANG Guang-qiu (Plasma Physics and Material Laboratory,Beijing Institute of Graphic Communication,Beijing 102600,China)  
It is very important to popularize the computer to plate technology(CPT) using the conventional pre-sensitized plate in our printing and packaging industry.In A novel nitrogen plasma light source stimulated by RF electrodeless field discharge is reported.By using it a commercial PS plate from Chinese Academy of Printing Technology is successfully exposed.The spectrum analysis shows the lamp we developed is more suitable for PS plate exposure than that very popular used iodine gallium lamp.And further the optimum parameters of our light source is explored from the RF power and working pressure.Under the conditions of incident power 160W,working pressure 230Pa with two focalized lens,an optical power density of 2.23mW/cm2 is obtained.At last the exposure result of PS plate with our UV light source is represented.
【Fund】: 北京印刷学院青年基金(600004);; 北京市重点学科建设项目(E-b-05-74);; 北京印刷学院人才引进基金(0600024)
【CateGory Index】: TS801.8
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【Citations】
Chinese Journal Full-text Database 5 Hits
1 LI Chao-Yang,CHEN Qiang,ZHANG Guang-qiu (Plasma physics and material laboratory,Beijing Institute of Graphic Communication,Beijing 102600,China);The Study of the Sensitive Properties of Conventional PS Plate[J];Information Recording Materials;2006-02
2 LI Chao-yang,CHEN Qiang,ZHANG Guang-qiu(Plasma physics and material laboratory,Beijing Institute of Graphic Communication,Beijing 102600,P.R.China);Photosensitivity Realization of the Conventional PS Plate by N_2 Plasma Light Source Generated in Hollow Cathode Discharge[J];Photographic Science and Photochemistry;2006-03
3 Zhen Feng(NO. 2 Film Factory,China Lucky Group CO.,Nanyang,Henan 473003);The Present and Future of PS Plates[J];Image Technology;2002-01
4 XING Xiao-kun(1.NO.2 Film Factory,China Lucky Film Group Co.,Nanyang 473003)(2.Tianjin Civil Aviation Advertising Co. Tianjin 300200);Present Status and Future Development Trends of Graphic Arts Plate Materials[J];Image Technology;2004-02
5 Yang Bing,Pu Yikang (Department of Electrical and Engineering,Tsinghua University,Beijing,100084,China) Sun Dianzhao (Institute of Semiconductor of CAS,Beijing,100083,China);Emission Spectra of Nitrogen Plasma in RF Auxiliary GaN MBE Film Growth[J];;2002-02
【Co-citations】
Chinese Journal Full-text Database 8 Hits
1 LI Chao-yang,CHEN Qiang,ZHANG Guang-qiu (Beijing Institute of Graphic Communication,Beijing 102600,China);Comparative Study on the Photosensitive Character of Conventional PS Plate[J];Packaging Engineering;2006-06
2 LI Chao-Yang,CHEN Qiang,ZHANG Guang-qiu(Plasma physics and material laboratory,Beijing Institute of Graphic Communi cation,Beijing 102600,China);The Experimental Study of the Novel N_2 Plasma Light Source for Plate Making in Printing Industry[J];Information Recording Materials;2006-03
3 LI Chao-yang,CHEN Qiang,ZHANG Guang-qiu,YE Li-ming,PU Ke-yi(Beijing printing & packaging technology key laboratory,Plasma Physics and Material branch,Beijing Institute of Graphic Communication,Beijing 102600,China);A Novel Pulse Plasma Light Source for CTCP Technology in Printing Industry[J];Information Recording Materials;2006-06
4 KUANG Liang-ju,ZOU Ying-quan (Departent of chemistry,Beijing Norm al University,Beijing 100875,China);The development of Negative presensitized plate[J];Information Recording Materials;2007-06
5 LIU Zheng-ping,WANG Pei-nan,YANG Wei-dong,ZHENG Jia-biao,and LI Fu-ming State Key Joint Lab for Materials Modification by Triple Beams,Department of Physics,Fudan University,Shanghai 200433,China;Spectroscopic Study on the High Voltage Fast Pulsed Discharge of Nitrogen,Ammonia or Their Mixture[J];Spectroscopy and Spectral Analysis;2001-05
6 LI Chao-yang,CHEN Qiang,ZHANG Guang-qiu (Plasma Physics and Material Laboratory,Beijing Institute of Graphic Communication,Beijing,102600);A Nitrogen Plasma Light Source Stimulated by RF Electrodeless Field Discharge for CTCP Technology in Printing[J];Image Technology;2007-03
7 Li Chaoyang,Chen Qiang,Zhang Guangqiu (Plasma Physics and Material Laboratory,Beijing Institute of Graphic Communication,Bejing 102600,China);Nitrogen Plasma Lamp Stimulated by RF Electrodeless Field Discharge[J];Chinese Journal of Vacuum Science and Technology;2007-04
8 LUO Li-Xia,JJ Jing-Jing,MA Shu-Yi(Baotou Medical College,Baotou 014040,China);Spectrum diagnosis of the methane plasmaexcited by helicon-wave[J];Journal of Atomic and Molecular Physics;2013-04
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