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Study of Electrochemical Micromachining on Molybdenum Grid based on Taguchi Methods

He Tiejun,Wang Wei,Feng Haidi,Liu Zhengxun(Nanjing University of Aeronautics & Astronautics,Nanjing 210016,China)  
Electrolyte concentration,current density,design of cathode and interelectrode gap are the main factors of electrolytic photo etching process,especially for achieving the dimensional uniformity of molybdenum grids.In this paper,the Taguchi method is introduced to establish analytical and experimental procedure.It is demonstrated that the diameter of cathode and interelectrode gap are more remarkable amongst those influence factors,and the discipline of the electric field of interelectrode gap is analyzed by using ANSYS platform.On this basis,the molybdenum grids are successfully fabricated by using electrolytic photo etching with acidic and activated electrolyte.
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