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《Journal of Electron Devices》 2004-01
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Simulation and Design of Microwave ECR Large-area Magnetic Field

GAO Xu-dong, YANG Yin-tang (Institute of Microelectronics , Xidian university, Xi' an 710071, China)  
A simulation and design of ECR magnetic field is presented. With the structure of ECR magnetic field, we obtain the distributed function of a small magnetic block by model reasoning and modifying, and the distributed function of folded magnetic field. A software is programed to realize the simulation, to optimizer the design of magnetic field and to make it sure that this magnetic field can be used to realize the plasma source superior in quality.
【CateGory Index】: TN405.982
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【Citations】
Chinese Journal Full-text Database 1 Hits
1 SUN Jian\+1,WU Jia\|da\+1,ZHONG Xiao\|xia\+2,LAI Bing\+3,DING Xun\|min\+3 and LI Fu\|ming\+1(1\ State Key Joint Laboratory for Materials Modification by Laser, Ion and Electron Beams,Fudan University,Shanghai\ 200433, China) (2\ Department of Applied Ph;Large-Area Surface Treatment of Monocrystalline Silicon by ECR Plasmas at Low Temperature\+*[J];CHINESE JOURNAL OF SEMICONDUCTORS;2000-10
【Co-citations】
Chinese Journal Full-text Database 3 Hits
1 Yin Shengyi,Chen Guanghua,Wu Yueying,Wang Qing,Liu Yi,Zhang Wenli, Song Xuemei and Deng Jinxiang(Department of Materials Science and Engineering,Beijing University of Technology,Beijing 100022,China)[WT5”HZ];MWECR-CVD System with a New Magnetic Field and Deposition of a-Si∶H Films[J];Chinese Journal of Semiconductors;2004-05
2 LIU Guo-han~(1,3) DING Yi~1 HE Bin~2 ZHU Xiu-hong~2 CHEN Guang-hua~(1,2) HE De-yan~1 (1.School of Physical Science and Technology,Lanzhou University,Lanzhou 730000,China;2.College of Materials Science and Engineering,Beijing University of Technology,Beijing 100022,China;3.Research Institute of Sensor Technology,Gansu Academy of Sciences,Lanzhou 730000,China);High rate deposition of hydrogenated amorphous silicon thin film with MWECR-CVD system[J];Journal of Lanzhou University;2006-02
3 Xu Xinyan,Wang Jiayou,Yang Yintang,Li Yuejin,Wu Zhenyu (Institute of Microelectronics,University of Electronic Science and Technology,Xi′an,710071,China);Microwave Electron Cyclotron Resonance Plasma Etching System[J];;2002-05
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