Fabrication of micro/nano structures using focused ion beam implantation technology
XU Zong-wei~ 1,2 , FANG Feng-zhou~ 1,2 , ZHANG Shao-jing~1, CHEN Yun-hui~1(1. State Key Laboratory of Precision Measuring Technology & Instruments, Centre of MicroNano Manufacturing Technology, Tianjin University, Tianjin 300072;2.Tianjin MicroNano Manufacturing Tech. Co., Ltd, Tianjin 300457,China)
One novel micro/nano structures fabrication method was developed by using focused ion beam implantation (FIBI) and FIB XeF_2 gas assisted etching (FIB-GAE). Firstly, the FIB cross section method was used to study the FIB parameters' influence on the FIBI depth. Nanoparticles with 10～15 nm diameter were found evenly distributed in the FIBI layer, which can serve as XeF_2 assisted etching mask when the ion dose is larger than 1.4×10~ 17 ion/cm~2. The FIBI layers being used as the etching mask for subsequent FIB XeF_2 gas assisted etching process was explored to create different micro/nano-structures, such as nano-grating, nano-electrode and sinusoidal micro-structures. It is found that the method of combining FIBI with subsequent FIB-GAE is efficient and flexible in micro/nano-structuring, and it is one kinds of promising technology in the micro/nano structures fabrication.