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《Electronics World》 2018-10
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Analysis and Improvement of Side Polyimide Mura in narrow border products

WANG Hai-cheng;SHIN Jae-gwan;LIU Meng;SHI Qiu-fei;FENG Bin;WEN Bin;CELL Department of Beijing BOE Display Technology CO.;  
In the thin film transistor liquid crystal display(TFT-LCD)industry,high generation line tends to use inkjet printing as polyimide film coating method.In order to realize the narrow border of products,the space around panel need further downward,but it has adverse effect to the spread of inkjet printing polyimide.In this thesis,the reason of side polyimide mura in narrow border products was studied,and found the polyimide of via hole for common electrode piled up apparently,the accumulation hinders the diffusion of polyimide in display area,thick polyimide film affects the state of surrounding liquid crystal arranged,thus generate defect.The defect is improved by adjusting the via hole size and density and combining the optimum condition of prebake.Therefore,the above-mentioned results provide basis for related issues in the future.
【CateGory Index】: TN873.93
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