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《ENVIRONMENTAL SCIENCE AND TECHNOLOGY》 1996-01
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Slurry sampling and Halogenation-Electrothermal Vaporization Inductively Coupled Plasma Atomic Emission Spectrometry for Direct Determination of Bismuth in Water Sediment

Yang Min; Liao Zhenhuan(Department of Chemistry,Wuhan University Wuhan 430072)  
Self-made polytrifluorochloroethylene slurry has been taken as halogenation agent in electrothermal vaporization inductively coupled plasma atomic emission spectrometry (ETVICP-AES) for determination of Bismuth,which promotes the evaporization of Bi. The main working parameters for ETV-ICP-AES have been optimized and the comcentration of the halogenation agent was examined for the Bi determination. The detection limit of Bi was 24ng/ml and relative standard deviation 3. 2% (n=5). The proposed method has been applied successfully to direct determination of Bi in water sediment. The recovery ranged between 99. 7-106. 8%.
【CateGory Index】: O657.31
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【Citations】
Chinese Journal Full-text Database 1 Hits
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【Co-citations】
Chinese Journal Full-text Database 10 Hits
1 Huang Min Jiang Zucheng Zeng Yun'e (Department of Chemistry,Wuhan University,Wuhan 430072);Vaporization Behaviors of Analytes Introduced by Electrothermal Vaporization in Inductively Coupled Plasma-Atomic Emission Spectrometry[J];Chinese Journal of Analytical Chemistry;1991-10
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5 Hu Bin; Jiang Zucheng; Kuang Yanming(Department of Chemistry, Wuhan University, Wuhan 430072);Determination of Titanium, Nickel and Lead by Electrothermal Vaporization-Inductively Coupled Plasma Atomic Emission Spectrometry With the Use of Fluorine-Containing Matrix Modifier[J];Chinese Journal of Analytieal Chemistry;1996-04
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【Co-references】
Chinese Journal Full-text Database 10 Hits
1 XUE Ai fang, QIAN Sha hua, HUANG Gan quan (College of chemistry and environmental science,Wuhan University Wuhan 430072);Preconcentration and separation with crosslinked chitosan for determination of trace manganese in environmental samples by flame atomic absorption spectrometry[J];Environmental Science and Technology;2000-04
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