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《Opto-electronic Engineering》 2001-01
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Optical Microlithography with Phase Shifting Mask and Optical Proximity Effect Correction

FENG Bo ru 1, ZHANG Jin 1,2 ,HOU De sheng 1 ZHOU Chong xi 1,SU Ping 1 (1.State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209,China; 2.Department of  
The principle for improving microlithographic resolution and focal depth with phaseshifting mask is described in detail in the paper.Optical proximity effect correction method,the mechanism for improving the quality of microlithographic patterns by PSM and OPC and some disign problems of the proximity effect corrected mask are introduced.
【Fund】: 国家自然科学基金项目 !(697760 2 8) ;; 中国科学院光电技术研究所所长基金;; 微细加工光学技术国家重点实验室开放基金资助项目
【CateGory Index】: TN305.7
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