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《Materials for Mechanical Engineering》 2013-10
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Effects of Deposition Temperature and Ar Pressure on Phase Structure and Properties of Ti Films

GAO Xiao-ming;SUN Jia-yi;HU Ming;WENG Li-jun;FU Yan-long;YANG Jun;TAN Hong-gen;Shanghai Key Laboratory of Spacecraft Mechanisms;State Key Laboratory of Solid Lubrication,Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences;  
Ti films were deposited at low temperature(166K)and room temperature(300K)under different Ar pressures of 0.2-0.8Pa by arc ion plating(AIP).The phase structure and properties of the Ti films were studied using X-ray diffraction(XRD),atomic force microscope(AFM),microhardness tester and scratch tester. The results show that the Ti films deposited at various deposition conditions had a two-phase nanocomposite structure of hexagonal closed-packed(hcp)ω-Ti andα-Ti phases,and showed an increase in the relative content ofω phase with decreasing deposition temperature and Ar pressure.Thus the Ti films,deposited at lower temperature and Ar pressure,presented a higher microhardness because theωphase is a hard brittle phase,and a better adhesion with steel substrate.Therefore,the Ti films deposited at lower temperature and Ar pressure were feasible for interlayers between solid lubricating films and steel substrates to improve their adhesion and load carrying capacity.
【Fund】: 国家自然科学基金资助项目(50301015 21173243)
【CateGory Index】: TB383.2
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