Full-Text Search:
Home|Journal Papers|About CNKI|User Service|FAQ|Contact Us|中文
《Optical Technique》 2005-03
Add to Favorite Get Latest Update

Silica based 16×0.8nm arrayed waveguide grating multiplexer design, fabrication and testing

LI Jian, AN Jun-ming, WANG Hong-jie, HU Xiong-wei(Institute of Semiconductors, Chinese Academy of Sciences, Beijing100083, China)  
A 16×0.8nm silica based arrayed waveguide grating multiplexer operating around 1550nm was designed and fabricated. The testing result shows that the channel spacing is 0.8nm (100GHz), the insertion loss of the multiplexer is 16.8dB, including the material absorb loss which is 11.95dB, the cross talk of the neighboring output port is less than -17dB and the uniformity of the insertion loss is less than 2.2dB.
【Fund】: 国家重点基础研究发展规划(G2000036602);; 国家自然科学基金(69889701)资助项目
【CateGory Index】: TN253
Download(CAJ format) Download(PDF format)
CAJViewer7.0 supports all the CNKI file formats; AdobeReader only supports the PDF format.
©2006 Tsinghua Tongfang Knowledge Network Technology Co., Ltd.(Beijing)(TTKN) All rights reserved