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《Acta Optica Sinica》 1996-06
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Fabrication Errors Analysis and Simulation of Binary Optical Element

Xu Ping; Zhang Xaochun; Guo Lurong; Guo Yongkang; Zhou Xiang(Information Optics Institute, Sichuan University, Chengdu 610064)Du Chunlei; Zhou Mingbao(The State Laboratory for Optical Technologies on Microfabrication, Institute of Optics and Elertronics  
In this paper, the analytic expression of diffraction efficiency corresponding to the mask etch-depth errors is deduced from the scale diffraction theory. Choosing 4-step and 8-step blazed grating as an example, we simulated systematically main registeringetch errors and their interactions of binary optical element using computer. The results of computer simulation agree well with that of the analytic method. It can provide theoretical basis and experiment parameter for practical fabrication.
【Fund】: 中国科学院光电技术研究所微细加工光学技术国家重点实验室资助;;国家自然科学基金;;国家教委博士点基金
【CateGory Index】: TH70
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