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《ACTA OPTICA SINICA》 2000-04
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Fine Correction of Optical Proximity Effect by Using Gray Tone Coding Mask

Du Jinglei 1) Su Jingqin 1) Luo Kejian 2) Zhang Yixiao 1) Guo Yongkang 1) Cui Zheng 3) Zhou Chongxi 4) 1), Department of Physics, Sichuan University, Chengdu 610064 2), Neijiang Education Institute, Nei  
A new method has been proposed to realize fine optical proximity correction (OPC) with gray tone coding mask instead of gray tone mask. The advantages of the new method are analyzed. The coding rules of the gray tone coding mask and the relationships between the gray tone coding mask and gray tone mask have been discussed. OPC simulation results are given with the gray tone coding mask and the synthesis area deviation of aerial image drops 10% after OPC.
【Fund】: 国家自然科学基金!(6 990 70 0 3);; 教育部博士点基金;; 中国科学院光电技术研究所微细加工光学技术国家重点实验室资助课题
【CateGory Index】: O439
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【References】
Chinese Journal Full-text Database 5 Hits
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【Citations】
Chinese Journal Full-text Database 1 Hits
1 Du Jinglei Huang Qizhong Yao Jun Su Jingqin Guo Yongkang (Physics Departments, Sichuan University, Chengdu 610064) Cui Zheng (Rutherford Appleton Laboratory, U.K.) Shen Feng (Institute of Optics and Electronics, The Chinese Academ;OPC with Grey Level Mask and Its Computer Simulation Study[J];ACTA OPTICA SINICA;1999-05
【Co-citations】
Chinese Journal Full-text Database 4 Hits
1 SHI Rui-ying, GUO Yong-kang (Phys. Dept. Sichuan University, Chengdu 610064 China; Microelectronics Center, Academia Sinica, Beijing 100010, China);Optical proximity correction for improving pattern quality in submicron photolithography[J];Semiconductor Technology;2001-03
2 Du Jinglei,Su Jingqin,Yao Jun,Zhang Yixiao,Gao Fuhua,Yang Lijuan (Department of Physics,Sichuan University,Chengdu,610064) Cui Zheng (Central Microstructure Facility,Rutherford Appleton Laboratory,Chilton,Didco t,OX11 0QX,UK);Bright and dark figure method for OPC and its experimental research[J];LASER TECHNOLOGY;2000-04
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