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《ACTA OPTICA SINICA》 2000-04
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Phase Shifting Mask for 0.35 μm Contact Holes

Zhou Chongxi Feng Boru Hou Desheng Zhang Jin Chen Fen Sun Fang (State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, The Chinese Academy of Sciences, Chengdu 610209)  
Aerial image distribution of a 0.35 μm contact hole with traditional mask, rim phase shifting mask (PSM), partial rim PSM, attenuating PSM are calculated based on Hopkins model, and the optimum parameters of different PSM are obtained. Attenuated PSM in enhancing resolution and improving the depth of focus in photolithography is of the most effective among them, especially when partial coherent factor (σ) is small.
【CateGory Index】: O438
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【Citations】
Chinese Journal Full-text Database 1 Hits
1 Feng Boru (State Key Laboratory of Optical Technology for Microfabrication,Institute of Optics & electronics, Chinese Academy of Sciences,Chengdu,610209) Chen Baoqin (Microelectronic Center,Chinese Academy of Sciences,Beijing,100029);Rim Phase Shifting Mask Technique[J];OPTO-ELECTRONIC ENGINEERING;1997-S1
【Co-citations】
Chinese Journal Full-text Database 3 Hits
1 ZHOU Chong xi,FENG Bo ru,HOU De sheng, ZHANG Jin,CHEN Fen,SUN Fang (State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics and Electronics, Chinese Academy of Sciences,Chengdu 610209,China);Simulation and Software Design of 0.35μm Phase Shift Masks[J];OPTO-ELECTRONIC ENGINEERING;1999-04
2 Zhou Chongxi Feng Boru Hou Desheng Zhang Jin( State Key Lab of Optical Technologies for Microfabrication, Institute of Optics and Electronics, The Chinese Academ y of Sciences, Chengdu 610209)( Received 29 Septem ber 1998; rev;Research of Attenuated Phase- Shifting M ask and Its Encoding M aking M ethod[J];ACTA OPTICA SINICA;1999-08
3 FENG Bo-ru1,ZHANG Jin 1,2,CHEN Bao-qin3,HOU De-sheng1,SU Ping1 (1State Key Lab of Optical Technologies for Microfabrication, Institute of Optics & Electronics,Chinese Academy of Sciences, Chengdu 610209,China;2Dept.of Physics,Sichuan University, Chen;Fabrication Process of Phase-Shifting Masks With Sub-resolution Patterns[J];Microfabrication Technology;2001-02
【Secondary Citations】
Chinese Journal Full-text Database 1 Hits
1 Sken Feng; Feng Boru; Sun Guoliang(State Key Labomtory of Optical Technologies for Microfabrication,Institute of Optics and Electronics,Chinese Academy of Sciences,Chengdu 610209);COMPUTER SIMULATION OF EFFECTS OF PHASE-SHIFT MASK ON AERIAL IMAGE INTENSITY PROFILE OF PHOTOLITHOGRAPHIC PATTERN[J];MICROFABRICATION TECHNOLOGY;1995-01
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