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《Acta Optica Sinica》 2008-07
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Optimized Design of Transmission Grating Used for 13.4 nm Soft X-Ray Interference Lithography

Zhu Weizhong1,2 Wu Yanqing1 Chen Min1 Wang Naxiu1 Tai Renzhong1 Xu Hongjie11Shanghai Institute of Applied Physics,Chinese Academy of Sciences,Shanghai 201800,China2Graduate University of Chinese Academy of Sciences,Beijing 100049,China  
Based on the rigorous coupled-wave analysis, considering the actual fabrication processes for nanometer level gratings,the first-order diffraction efficiency was simulated for a normally-incident transmission grating at wavelength of 13.4 nm.The influence on the first-order diffraction efficiency by parameters,such as grating materials,relief thickness,gap/period ratio,and trapezoidal angle on the relief are analyzed quantitatively.The results show at the wavelength,the phase of the relief(Si3N4,Cr,Au) effects grating diffraction greatly.The phase shift of the nonmetallic relief(Si3N4) is found to precede the metallic materials(Cr,Au).After optimization,Si3N4,Cr and Au gratings with Si(Si3N4) substrate are proposed,which have the higher first-order diffraction efficiency than the Cr/Si3N4 compound gratings currently used for soft X-ray interference lithography.
【Fund】: 上海同步辐射装置干涉光刻实验站项目资助课题
【CateGory Index】: O436.1
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