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《Acta Optica Sinica》 2017-08
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Graded Multilayer Film Design for Anamorphic Magnification EUV Lithographic Objective

Shen Shihuan;Li Yanqiu;Jiang Jiahua;Liu Yan;Liu Ke;Liu Lihui;Key Laboratory of Photoelectronic Imaging Technology and System,Ministry of Education,School of Optoelectronics,Beijing Institute of Technology;  
High numerical aperture(NA)projection objectives with anamorphic magnification are demanded for extreme ultraviolet(EUV)lithography down to 10 nm resolution,which results in extreme increase of incident angle and incident angle range of objective lens system.Traditional normalized multilayer film and laterally graded multilayer film cannot satisfy the requirement of reflectivity and image quality in the projection objectives.A method combining laterally graded multilayer film with depth graded multilayer film is presented.The laterally graded multilayer film is used to increase the reflectivity and the depth graded multilayer film is used to enhance the reflectivity uniformity and compensate the wavefront aberration introduced by the laterally graded multilayer film.The method is used to design the multilayer film of an anamorphic magnification EUV lithographic objective with NA of 0.50.The results show that the average reflectivity of each mirror is higher than 60% and the reflectivity peak-to-valley value of each mirror is less than 3.5% with imaging performance unchanged.Which satisfies the lithographic requirement,and verifies the feasibility of this method.
【Fund】: 国家科技重大专项;; 国家自然科学基金面上项目(61675026);国家自然科学基金重大科研仪器研制项目(11627808)
【CateGory Index】: TN23
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