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《ACTA OPTICA SINICA》 1996-10
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Emittance Measurement of a High Brightness Pseudospark Produced Electron Beam

Huang Yu Wang Mingchang Zhang Lifen Lu Bin Feng Chengshi Zhou Huifen (Shanghai Institute of Optics and Fine Mechanics, The Chinese Academy Sciences, Shanghai 201800)  
We report the emittance measurement of a electron beam produced in a pseudospark discharge device driven by a pulse line accelerator. A ten gap pseudospark device was operated at 200 kV, with anitrogen gas fill presure of 15 Pa. Small diameter (~1 mm) electron beam with current about 2 kA has been generated. The rms emittance of the beam is measured to be ε rms ≈ 48 mm·mrad about 5 cm downstream of the anode plane. The normalized emittance is then found to be ε n≈ 47 mm·mrad.
【Fund】: 国家自然科学基金
【CateGory Index】: O434.12
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