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《Acta Photonica Sinica》 2005-01
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Distortion Detect of Large Field Projection Lithography Lens

Ma Tao,Shen YibingZhejiang Univercity State Key Laboratory of Optical Instrument, Hangzhou 310027  
Distortion is the key index of lithography lens system, but there is no much reports about it. This paper presents a new theory and system about distortion detect, and a new method about how to process the detected data. A new 6-inch dimension, 3 μm resolution large field projection lithography lens was detected with this system and the results is that the distortion of this lithography lens is less than 2.0 μm in all field.
【CateGory Index】: TH74
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