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《Infrared Technology》 2011-01
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Growth and Thickness Uniformity Research of Amorphous MCT Films under Different Target Spacings

YANG Li-li,WANG Gguang-hua,KONG Jin-cheng,LI Xiong-jun, KONG Ling-de,LI Fan,DENG Gong-rong,JI Rong-bin(Kunming Institute of Physics,Kunming 650023,China)  
Uses the Radio Frequency(RF)Magnetron Sputtering method to grow the amorphous HgCdTe thin films under different target spacings and then studies its growth rate,preferred orientation and thickness uniformity.The experimental results indicated that with decreasing the distance between target and substrate or increasing sputtering power the growth rate increased;Under different target spacings the Hg1-xCdxTe thin films crystallization characteristic is distinct,the preferred orientation is(111) direction;Increase the distance between the target and substrate can enhance the film thickness uniformity effectively,Under the 75 mm target spacing,the thickness uniformity is better than 7% and 1% at 50 mm×60 mm and 10 mm×10 mm area.
【Fund】: 国家自然科学基金项目(项目编号:60576069)
【CateGory Index】: O484.1
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