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《Laser & Infrared》 2017-12
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Vanadium oxide film modified by UV laser

LI Hai-ou;DING Zhi-hua;PAN Ling-feng;WANG Xiao-feng;ZHANG Zi-chen;Guilin Key Laboratory of Precision Navigation Technology and Application,Guilin University of Electronic Technology;Key Laboratory of RF Circuits and Systems,Ministry of Education,Hangzhou Dianzi University;Institute of Microelectronics of Chinese Academy of Sciences;  
After the preparation of the vanadium oxide thin film,annealing treatment is required to reduce the square resistance of the amorphous vanadium oxide film and improve the film crystallization characteristics. The conventional annealing methods take a long time and the annealing process will lead to the degradation of the device performance.The vanadium oxide thin films by laser precision control is treated by changing the laser power,the Gaussian spot morphology and the overlap rate. The effects of laser energy density and spot overlap rate on the sheet resistance,surface roughness and crystallinity of vanadium oxide thin films were studied. The experimental results show that when the laser power is 0. 7 W,the spot overlap rate is 93. 33% and the spot energy density is 62. 2 m J/cm~2,the sheet resistance of annealed vanadium oxide thin film is obviously reduced,the surface of the film is smooth,and the crystallinity of vanadium oxide is better.
【Fund】: 国家自然科学基金项目(No.61474031);国家自然科学基金项目(No.51505456);国家自然科学基金项目(No.61376083)资助;; 广西自然科学基金项目(No.2016GXNSFDA380021);; 桂林市科技开发项目(No.20160216-1);; 桂林电子科技大学研究生教育创新计划项目(No.2016YJCX15);; 电子薄膜与集成器件国家重点实验室开放课题(No.KFJJ201604);; 吉林省省级经济结构战略调整引导资金专项基金项目(No.2015Y028)
【CateGory Index】: TN304.21
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