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《Journal of Jilin University(Science Edition)》 2006-01
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Factors Affecting the Stability of Large Current Hot Cathode Glow Discharge

BAI Yi-zhen~1,L Xian-yi~2,JIN Zeng-sun~2,JIANG Zhi-gang~2(1.Department of Physics,Dalian University of Technology,Dalian 116023,Liaoning Province,China;2.State Key Laboratory of Superhard Materials,Jilin University,Changchun 130012,China)  
Large current hot cathode glow discharge was used for plasma chemical vapor deposition of diamond films.It improved deposition rate and films quality efficiently.Large current glow discharge has a strong tendency to transform to arc discharge. This paper focuses our attention on the(factors) affecting the stability of large current hot cathode glow discharge.The research results show that the cathode temperature,the cathode(surface) state and the size and place disposition between cathode and anode have influences on the stability of glow discharge,respectively.
【Fund】: “863”计划新材料领域资助项目基金(批准号:2002AA325090)
【CateGory Index】: O461.21
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【Co-citations】
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1 BAI Yizhen JIN Zengsun JIANG Zhigang HAN Xuemei (National Laboratory of Superhard Materials, Jilin University, Changchun 1300S3) Supported by the New Materials Field of National 863 Plan No.2002AA325090. Manuscript received January 27, 2003; in revised form March 17, 2003. To whom correspondence should be addressed, Tel:(0431)5168879,;Influence of hot cathode glow discharge on the deposition of diamond films[J];Chinese Journal of Materials Research;2003-05
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