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《科学通报(英文版)》 2003-16
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Preparation of graphitic carbon nitride by electrodeposition

LI Chao1,2, CAO Chuanbao1 & ZHU Hesun1 1. Research Center of Materials Science, Beijing Institute of Technology, Beijing 100081, China; 2. Department of Chemical Engineering, Zhengzhou Institute of Light Industry, Zhengzhou 450002; China Correspondence should be addressed to Cao Chuanbao  
The CNx thin film was deposited on Si(100) substrate from a saturated acetone solution of cyanuric tri-chloride and melamine (cyanuric trichloride/melamine=1︰1.5) at room temperature. X-ray diffraction (XRD) results showed that the diffraction peaks in the pattern coincided well with those of graphite-like carbon nitride calculated in the literature. The lattice constants (a=4.79 ? c=6.90 ) for g-C3N4 matched with those of ab initio calculations (a=4.74 ? c=6.72 ? quite well. X-ray photoelectron spectroscopy (XPS) measurements indicated that the elements in the de-posited films were mostly of C and N (N/C=0.75), and N (400.00 eV) bonded with C (287.72 eV) in the form of six-member C3N3 ring. The peaks at 800 cm-1, 1310 cm-1 and 1610 cm-1 in the Fourier transform infrared (FTIR) spec-trum indicated that triazine ring existed in the product. These results demonstrated that crystalline g-C3N4 was ob-tained in the CNx film.
【CateGory Index】: O484.1
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