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XRD ANALYSIS OF ZnO THIN FILMS PREPARED BY RF MAGNETRON SPUTTERING

WANG Dong-mei~1,LU Jun~1,CHEN Chang-qi~2,WU Yu-cheng~1,ZHENG Zhi-xiang~1(1.School of Material Science and Engineering,Hefei University of Technology,Hefei 230009,China;2.Vacuum Laboratory of School of Mechanical Engineering,Hefei University of Technology,Hefei 230009,China)  
Polycrystalline ZnO films were deposited on glass substrates by radio frequency(RF) magnetron sputtering technique.The as-deposited films were annealed at various temperatures(350~600℃) in air and at 600℃ in N_2.The influence of sputtering parameters such as sputtering power,O_2 partial pressure,substrate temperature and annealing on the crystallization of the ZnO films was investigated by X-ray diffraction(XRD).The results show that the crystallization of the film has been promoted by desirable substrate temperature or annealing.
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