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《Journal of Qufu Normal University(Natural Science)》 2010-04
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Influence of Deposition Rates on Hafnium Dioxide Film Stress and Optical Properties

QI Rui-yun,WU Fu-quan,HAO Dian-zhong,WANG Qing,WU Wen-di(Shandong Provincial Key Laboratory of Laser Polarization and Information Technology,Laser Institute,Qufu Normal University,273165,Shandong,Qufu,PRC)  
Using electron beam evaporation fabricated HfO2 films,the selected deposition rates were 3.3/s,5.5/s and 9.6/s,respectively.We tested the samples with ZGYO interferometer,UV3101-PC spectrophoto-meter,D/Max-ⅢA-type X-ray diffraction instrument and JSM-6700F cold field emission scanning electron microscopy.The experimental results show that the HfO2 films are all amorphous structure under our selected conditions.The residual stress and intrinsic stress of the HfO2 have the same trend,rised with the increasing of deposition rate firstly,and then decreased,At the deposition rate of 3.3/s,it has the minimum stress.The refractive index of HfO2 film fabricated under different deposition rates are all normal dispersion.The HfO2 film fabricated at 3.3/s has minimum dispersion and fine flatness.These results can provide references for making high-quality HfO2 films.
【CateGory Index】: O484.41
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