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《Journal of Synthetic Crystals》 1993-01
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Growth of Diamond Films by Microwave plasma CVD

Zhang Zhiming Hong Ailing Cai Qiyu Zhuang Zhicheng Zhu Pingfang Li Shenghua (Shanghai Jiaotong University,200030)  
The structure characterization,technological parameters,andgrowth peculiarites of diamond films by microwave plasma CVD were discussedin this paper.polycrystaline films whose structures were identical to those ofnatural diamond could be obtained by microwave plasma CVD as well as byhot-filament CVD.The growth was strongly influenced by gas pressures,ele-ctrieal properties of substrates and ways ef placing them besides carbon conce-ntration and substrate temperature.The Raman peak at 1430 cm~(-1) might berelated with sputtering phenomena.
【Fund】: 国家863高科技;; 上海市自然科学基金
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