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《Journal of Synthetic Crystals》 2006-01
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Quantum State of Poly-Si Films at Middle Temperature on Glass Substrate

JIN Rui-min,LU Jing-xiao,FENG Tuan-hui,WANG Hai-yan,ZHANG Li-wei(Key Laboratory of Material Physics of the Ministry of Education of China,Zhengzhou University,Zhengzhou 450052,China)  
Amorphous silicon films prepared by PECVD on the glass substrate have been crystallized by conventional furnace annealing(FA) at middle temperature.From the Raman spectra,X-ray diffraction(XRD) and scanning electronic microscope(SEM),the quantum state in these processions was found and discussed.The crystallized grain size is biggest at 850℃ for 3h by FA.
【CateGory Index】: TB383.2
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