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《Journal of Synthetic Crystals》 2006-06
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Influnce of Sputtering Pressure on Hydrogen Evolution Reaction of Catalysis Electrode Films

SONG Hong,ZHANG Qin-bao,WEI Chang-chun,GENG Xin-hua(Institute of Photo-electronics Thin Film Devices and Technique of Nankai University,Tianjin 300071,China;Key Laboratory of Photo-electronics Thin Film Devices and Technique of Tianjin, Tianjin 300071,China;Key Laboratory of Opto-electronic Information Science and Technology(Nankai University,Tianjin University), Ministry of Education,Tianjin 300071,China)  
Using DC magnetron sputtering device to prepare hydrogen evolution reaction(HER) electrodes,at the rang of 1.0-4.0Pa,catalysis electrode films of NiFe,CoMo of HER prepared at different sputtering pressure,their crystal size and HER overpotential decreased with increasing of chamber pressure,and their overpotential and Tafel slope were changed sharply at 2.0Pa.These showed that crystal size is crucial factor to the step of HER,and Tafel slope changed with it.
【CateGory Index】: O646.5
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