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《Journal of Shanghai Jiaotong University》 2002-01
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Photocatalytic Characteristics of TiO_2 Thin Film Deposited with Chemical Vapour Deposition

LI Wen yi 1, LI Wen jun 2, WU Zheng huang 3, ZHAO Jun fu 3, SUN Yan ping 3, CAI Xun 1 (1. Open Lab. of the Ministry of Education for High Temperature Materials and Testing, Shanghai Jiaotong Univ., Shanghai 200030, China; 2. Informatio  
Using titanium tetraisopropoxide (TTIP) as precursor, a TiO 2 thin film was prepared by low pressure chemical vapour deposition (LPCVD). The titanium dioxide was fixed, and the size effect of the photocatalyst was retained as much as possible. The influence of process condition on the properties of TiO 2 films was studied. The use of LPCVD TiO 2 film for the photocatalytic degradation of an organic compound phenol was investigated. The effect of crystalline structure, thickness, substrates on catalyst activity was also researched.
【CateGory Index】: O643.32
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