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Application of Indentation Test Method in Investigating Adhesion Properties of Chemical Vapor Deposited Diamond Films

KUANG Tong-Chun; LIU Zheng-Yi; ZHOU Ke-Song; DAI Ming-Jiang; WAN De-Zheng(South China University of Technology Guangzhou 510641 China)(Guangzhou Research Institute of Non-Ferrous Metals Guangzhou 510651 China)  
The feasibility of using the indentation test method to evaluate the adhesion property of chemical vapor deposited diamond film was investigated initially on the basis of observations and analyses of the crackillg or delamination ways of diamond films under indentation. Tile critical load for lateral crack initiation or peeling-off (Pc,) and the cracking resistance (dP/dX), two useful adhesion parameters, were used to characterize the adhesion properties of diamond films synthesized by various pretreatment methods and deposition process parameters. The relationships between adhesion properties and methane concentrations, deposition pressllres, deposition powers and residual stresses were studied. Adhesion properties of diamond films call be improved using proper pretreatment of substrate surface, suitable methane concentration, lower deposition pressure and higher deposition power.
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