Full-Text Search:
Home|About CNKI|User Service|中文
Add to Favorite Get Latest Update

Influence of the Substrate Temperature on the Properties of Nb-doped TiO_2 Films Deposited by DC Magnetron Sputtering

HUANG Shuai1,LI Chen-Hui1,SUN Yi-Hua2,KE Wen-Ming1(1.State Key Laboratory of Material Processing and Die & Mould Technology,Huazhong University of Science and Technology Department of Material Science and Engineering,Wuhan 4300074,China;2.College of Mechanical & Material Engineering,China Three Gorges University,Yichang 443002,China)  
Nb-doped(2.5wt%) TiO2 thin films was deposited on glass substrate by DC magnetron sputtering from a ceramic target and the films thickness was controlled in the range from 300 nm to 350 nm.The structure,surface morphology and optical properties of the films deposited at different substrate temperatures were investigated by X-ray diffraction,scanning electron microscope,and optical transmission spectroscope.The films deposited at 150℃,250℃ and 350℃ were amorphous,anatase and rutile,respectively.The grain size of the typical anatase film deposited at 250℃ reached the maximum of 32 nm.The roughness of the films decreased and their density increased with the rising of substrate temperature.The average optical transmittance of films were around 70% when the substrate temperatures were below 250℃.As the substrate temperature were risen to 350℃,the films’ transmittance dropped to 59%.It indicated that the transmittance of visible light was hindered by the rutile phase in the Nd-doped TiO2 films.The optical band gap of the films were in the range from 3.68 eV to 3.78 eV,and the optical band gap of the typical anatase film deposited at 250℃ reached the highest value of 3.78 eV.
Download(CAJ format) Download(PDF format)
CAJViewer7.0 supports all the CNKI file formats; AdobeReader only supports the PDF format.
©CNKI All Rights Reserved