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Research Application and Platform Establishment of Electrochemical Atomic Layer Deposition

WANG Li-shi;ZHANG Guo-qing;Marie-Christine Record;BU Zhi-xiang;SUN Li;School of Mechanical Engineering,Hubei University of Technology;Hubei Provincial Key Laboratory of Green Materials of Light Industry,Hubei University of Technology;The Editorial Department of Journal of Yunnan Normal University,Yunnan Normal University;Institut Matériaux Microélectronique Nanosciences de Provence,Aix-Marseille Université;  
Electrochemical atomic layer deposition(E-ALD)is an electrochemical analogy to the conventional atomic layer epitaxy(ALE)under high vacuum environment.E-ALD can assemble different atomic monolayers,grown with the surface-limited mode,into a functional multilayered thin film at room temperature.This method can effectively reduce the thermal misfit between film and substrate and omit the subsequent annealing steps.In recent years E-ALD wins more and more popularity in the field of catalytic,thematic and photoelectric material research and application.This paper summarizes the development history,deposition theory,present research and application of E-ALD.In addition,we will introduce a newly developed E-ALD platform with corresponding controlling method.
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