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《Journal of Zhejiang University(Engineering Science)》 2006-01
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Overexposure control for stabilizing linewidth

LIANG Yi-yong~1,GU Zhi-qi~2,ZHANG Zhe-ming~3,YAN Wei~1,YANG Guo-guang~1(1.College of Information Science and Engineering,Zhejiang University,Hangzhou 310027,China;2.College of Science,Zhejiang University,Hangzhou 310027,China;3.School of Mathematical Science,Fudan University,Shanghai 200433,China)  
In order to obtain stabilizing linewidth,a novel overexposure technique was proposed for producing micro figures on thin photoresist by laser pattern generator.The energy distribution of the focused laser spot has Gaussian profile, and if the exposure dose threshold of the photoresist is less than and far away from the peak of that Gaussian curve,the linewidth will be less affected by the variation of exposure dose or exposure dose threshold,and so,will improve the linewidth stability.By increasing exposure dose,a group of short arcs was generated on the substrate coated with 0.6 μm photoresist.The test results showed that the experimental relation curve of linewidth and exposure dose accard well with the theoretical one.The overexposure technique is valuable for fabrication of devices with stabilized linewidth such as integrated optical gyroscope with spiral waveguide.
【Fund】: 浙江省教育厅科研资助项目(G20050436)
【CateGory Index】: TN405
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【References】
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1 Jin Zhanlei Tan Jiubin Zhang Shan Wang Lei(Institute of Ultra-Precision Optical & Electronic Instrument Engineering,Harbin Institute of Technology,Harbin,Heilongjiang 150001,China);Research of Linewidth Stabilizing Method During Defocusing Laser Direct Writing[J];Acta Optica Sinica;2008-09
【Citations】
Chinese Journal Full-text Database 1 Hits
1 XIONG Mu di, XIAO Wen li, XINAG Zhong bao(Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130021, China);Focussing servo system of laser direct writting device[J];OPTICS AND PRECISION ENGINEERING;2000-01
【Co-citations】
Chinese Journal Full-text Database 10 Hits
1 LIANG Fengchao1,2(1.Changchun Institute of Optics,Fine Mechanics and Physics,CAS,Changchun 130033,China; 2.Key Laboratory of Optical System Advanced Manufacturing Technology,Changchun 130033,China);Static Characteristics of Auto-Focusing Servo System Based on Critical Angle Method for Laser Direct Writing[J];Electronics Optics & Control;2011-05
2 HU Jun1,LIANG Feng-chao1,2,XIONG Mu-di3,ZOU Zhen-shu1,DU Wen-xi1,CHEN Shi-hui1 ( 1.Changchun Institute of Optics, Fine Machines and Physics, the Chinese Academy of Sciences, Changchun 130033, China; 2. Graduate School of the Chinese Academy of Sciences, Beijing 100039, China; 3. Dalian Maritime University, Dalian 116026, China );Key techniques influencing the linewidth evenness grade with laser direct writing on the spherical surface[J];Opto-Electronic Engineering;2006-03
3 FENG Xiao-guo~(1,2),FANG Liang~3,SUN Lian-chun~1 (1.Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China; 2.Graduate School of the Chinese Academy of Sciences, Beijing 100039, China; 3.Jilin University,Mech·-Elec·Eq·Research Institute Changchun 130022, China);Characteristic dimension design and fabrication of metallic mesh[J];Optics and Precision Engineering;2005-01
4 HAO Xian-peng1,2, REN Jian-yue1, ZOU Zhen-shu1(1. Changchun Institute of Optics , Fine Mechanics and Physics,Chinese Academy of Sciences, Changchun 130033, China;2. Graduate University of Chinese Academy of Sciences, Beijing, 100039, China);Design of focus error detection system based on critical angle method[J];Optics and Precision Engineering;2009-03
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6 LIU Wei, ZHANG Jing-he (Changchun Guangji Medical Instrument Co., Ltd, Changchun Institute of Optics, Fine Mechanics and Physics, Changchun 130021, China,E-mail:liuwei@yiliaoyiqi. com; Institute of Precise Engineering, Harbin Institute of Technology, Harbin 150001, China);Focusing-servo mechanism with nanometer resolution for laser direct writing device[J];Journal of Harbin Institute of Technology;2004-03
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8 QIAN Xun1,2,TENG Xiang-hong2,DU Hong-bing2,MA Tian-yi2(1.China University of Geoscience Beijing,Beijing 100083,China;2.Research Institute of Synthetic Crystals,Beijing 100018,China);Study on the Infrared Window with the Function of Radar Stralth[J];Journal of Synthetic Crystals;2008-05
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【Co-references】
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1 Song Dengyuan (Department of Electronics and Informational Engineering,Hebei University,Baoding 071002) Wang Xiaoping (Zhangjiakou Vocational University,Zhangjiakou 075000);Laser Holographic Lithography and Applications[J];SEMICONDUCTOR TECHNOLOGY;2000-02
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3 DU Jing-lei 1 ,SHI Rui-ying 2 ,CUI Zheng 3 ,GUO Yong-kang 1(1.Physics Department ,Sichuan University,Chengdu610064,China;2.Microelectronics R&D Center,The Chinese Academy of Scienes,Beijing100029,China;3.Rutherford Appleton Laboratory,Chilton,Didcot,Oxon OX110QX,UK);Proximity effects during mask fabrication[J];Semiconductor Information;2002-11
4 LIU Da-long, FANG Fang, MEM Hong, HAN Qin-pen, HE Hui-qi, WANG Ping College of Biomedical Engineering and Instrument Science, Biosensor National Special Lab., Key Lab. of Biomedical Engineering of Education Ministry of China, Zhejiang University, Hangzhou 310027, China;The Research on Electronic Tongue for Environmental Detection[J];Journal of Transcluction Technology;2004-01
5 HU Wei-jun1, ZOU Shao-fang2, ALISA Rudnitskaya3, WANG Ping11.Biosensor National Special Laboratory, Biomedical Engineering Key Laboratory of Education Ministry of China,College of Biomedical Engineering and Instrument Science, Zhejiang University, Hangzhou, 310027,China;2.Institute of Biomedical Engineering and Instrument, School of Automation, Hangzhou Dianzi University,Hangzhou, 310018, China;3. Chemistry Department. St. Petersburg University, St. Petersburg, 199034, Russia;Application of Hg Ion Selective Electrode in Measurement of Trace Element in Seawater[J];Chinese Journal of Sensors and Actuators;2007-06
6 Li Xuemin ;Lu Guowei (Institute of Applied Physics, UEST of China Chengdu 610054)Zhou Lishu (Institute of Optics Electronics, Chinese Academy of Science Chengdu 610041 );A Novel Method for Refractive Microlens Array Fabrication[J];JOURNAL OF UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA;2000-03
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9 WU Jian,LIU Yu ling,SHEN Yi bing,LI Pei yong (State Key Laboratory of Modern Optical Instruments, Zhejiang University, Hangzhou 310027,China);A Method for Eliminating the Delay of Acousto Optic Modulator in Laser Direct Writing System[J];Opto-electronic Engineering;2000-06
10 ZHANG Jin1,2, FENG Bo-ru2, GUO Yong-kang1, JIANG Shi-lei2, ZONG De-rong2, DU Jing-lei1, ZENG Yang-su1, GAO Fu-hua1 (1. Department of Physics, Sichuan University, Chengdu 610064, China; 2. State Key Laboratory of Optical Technologies for Microfabrication,;Laser Interference Photolithography for Fabricating Periodic Patterns in Large Area[J];Opto-electronic Engineering;2001-06
【Secondary References】
Chinese Journal Full-text Database 1 Hits
1 Li Ke1 Shi Peng1 Zhang Xiaobo2 Wang Shengbo1 Huang Kun1 Li Yongping1,3 1Department of Physics,University of Science & Tecnology of China,Hefei,Anhui 230026,China 2National Synchrotron Radiation Laboratory,University of Science & Technology of China,Hefei,Anhui 230026,China 3Anhui Key Laboratory of Optoelectronic Science and Technology,Hefei,Anhui 230026,China;Design and Preparation of Diffraction Optical Element in Dual Lens System[J];Chinese Journal of Lasers;2010-08
【Secondary Citations】
Chinese Journal Full-text Database 1 Hits
1 HOU Shu (Changchun Institute of Optics and Fine Mechanics, Chinese Academy of Sciences,Changchun 130022);The Influence of Aberration on Measuring Sensitivity in Critical angle Method of Total Reflection for Focus Error Detection[J];OPTICS AND PRECISION ENGINEERING;1998-01
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