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《Chinese Journal of Rare Metals》 2011-01
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Characteristics of Cu-Nb Thin Films Deposited by Magnetron Sputtering and Effect of Annealing

Guo Zhongzheng,Sun Yong,Duan Yonghua,Zhou Cheng,Peng Mingjun(Key Laboratory of Advanced Materials Yunnan Province,Kunming University of Science and Technology,Kunming 650093,China)  
The composition,structure,properties of Cu-Nb alloy thin films with Nb content of 1.16% ~27.04%(atom fraction) prepared by magnetron co-sputtering were investigated by EDX,XRD,TEM,SEM,microhardness instrument and resistivity meter in the condition of as-deposited and post-annealed states.The results showed that the microstructure of Cu-Nb alloy thin films was influenced by Nb addition significantly and adding Nb led to grain refinement.Cu-Nb thin films with 1.82% ~15.75%Nb possessed nanocrystalline structure with the presence of fcc Cu(Nb) non-equilibrium metastable supersaturated solid solution,and the Nb solubility increased with the incremental Nb concentration and maximum Nb solubility of 8.33%.The size of the microcrystal in Cu-Nb thin films decreased as the Nb content increased,and the microstructure of Cu-27.04%Nb thin films evolved to amorphous state.Comparison with pure Cu films,it could be found that the microhardness and electrical resistivity values of as-deposited Cu-Nb thin films significantly adding Nb,generally both of them were improved with the incremental Nb content in the films.The increment extent in the microhardness was flattened when Nb content was over 4.05%,and the microhardness of amorphous Cu-Nb thin films were lower than crystalline counterparts,but the resistivity increased continuously with Nb content.The microhardness and resistivity decreased after annealed at 200,400 and 650 ℃ for 1 h.The reduction extent in the microhardness and resistivity had positive correlation with annealing temperature.XRD and SEM analysis revealed coarseness in the grain sizes of the matrix phases of Cu-Nb films and the appearance of submicron Cu-rich second-phase,crystalline transition and subsequent grain growth were observed for amorphous Cu-27.04%Nb films after 650 ℃ annealed.It was considered that the formation and evolution of the microstructure and the properties of Cu-Nb thin films could be mainly attributed to the grain refining effect caused by Nb addition as well as the growth of matrix phase's grain sizes in annealing process.
【Fund】: 云南省自然科学基金重点资助项目(2004E0004Z);; 国家自然科学基金资助项目(50871049);; 云南省教育厅科学研究基金(09Y0091)资助
【CateGory Index】: TB383.2
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